Item type:Bachelors Thesis, Open Access

Schichtdickenbestimmung dünner Metallfilme mittels Schwingquarzwaage, Lichtabschwächung und AFM

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Date

2010-07-08

Authors

Publisher

Philipps-Universität Marburg
DOI

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Abstract

Research in the range of molecular semi conductors often needs substrates with special characteristics. For this purpose thin films of Silver and gold were produced, using Physical Vapor Deposition. Therefore controlling the deposition rate, which is measured by a Quarz-Crystal-Film-Monitor, is a critical factor. In order to calibrate this instrument the film thickness is also measured by an AFM. Furthermore a method, using light absorption to measure the film thicknes easy and without destroying the sample, is tested.

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Dates
Created: 2010Issued: 2010-07-08Updated: 2010-07-09
DOI
https://doi.org/10.17192/ed.2010.0008
Faculty
Fachbereich Physik
Publisher
Philipps-Universität Marburg
Language
ger
Data types
BachelorsThesis
Keywords
plane correctionplane correction
DFG-subjects
LichtabsorptionMetallschichtSchwingquarzSchichtdicke
DDC-Numbers
530
License
https://rightsstatements.org/vocab/InC-NC/1.0/
URI
https://open.uni-marburg.de/handle/10.17192/ed.2010.0008
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Klues, Michael: Schichtdickenbestimmung dünner Metallfilme mittels Schwingquarzwaage, Lichtabschwächung und AFM. : Philipps-Universität Marburg 2010-07-08. DOI: https://doi.org/10.17192/ed.2010.0008.

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This item has been published with the following license: In Copyright