Item type:Thesis, Open Access

Hydrazidoverbindungen des Niobs und Tantals im Kontext der Chemical Vapor Deposition von Refraktärmetallnitriden

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Date

2008-05-23

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Philipps-Universität Marburg
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Abstract

Synthesis and structural and spectroscopic characterization of hydrazido(1-) and hydrazido(2-) compounds of niobium, tantalum, molybdenum and tungsten. Here, bis(hydrazido)-magnesium compounds as well as mixed halogeno-hydrazido-magnesium salts, mono- and disilylated derivatives of 1,1-dimethylhydrazine were employed to introduce hydrazido ligands into group V and group VI chlorides and imido complexes. The obtained compounds are volatile and can be used as precursors in the CVD of refractory metal nitrides. Some of these compounds show ligand dynamics which were investigated NMR-spectroscopically.

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Dates
Created: 2008Issued: 2008-05-23Updated: 2011-08-10
DOI
https://doi.org/10.17192/z2008.0152
Faculty
Fachbereich Chemie
Publisher
Philipps-Universität Marburg
Language
ger
Data types
DoctoralThesis
Keywords
Refractory metal nitridesCVD-PrekursorDiffusion barrierCvd precursorHydrazido compoundsFlüchtigkeitRefraktärmetallnitrideHydrazidoverbindungen
DFG-subjects
DestillationDiffusionsbarriereAusgangsmaterialMagnesiumNiobTantalHydrazinderivateNitrideMOCVD-VerfahrenCVD-Verfahren
DDC-Numbers
540
License
https://rightsstatements.org/vocab/InC-NC/1.0/
URI
https://open.uni-marburg.de/handle/10.17192/z2008.0152
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Gaess, Daniel (135694124): Hydrazidoverbindungen des Niobs und Tantals im Kontext der Chemical Vapor Deposition von Refraktärmetallnitriden. : Philipps-Universität Marburg 2008-05-23. DOI: https://doi.org/10.17192/z2008.0152.

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