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Schichtdickenbestimmung dünner Metallfilme mittels Schwingquarzwaage, Lichtabschwächung und AFM

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Date

2010-07-08

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Philipps-Universität Marburg
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Abstract

Research in the range of molecular semi conductors often needs substrates with special characteristics. For this purpose thin films of Silver and gold were produced, using Physical Vapor Deposition. Therefore controlling the deposition rate, which is measured by a Quarz-Crystal-Film-Monitor, is a critical factor. In order to calibrate this instrument the film thickness is also measured by an AFM. Furthermore a method, using light absorption to measure the film thicknes easy and without destroying the sample, is tested.

Keywords

plane correction, plane correction

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https://open.uni-marburg.de/handle/10.17192/ed.2010.0008

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